Semiconductor wafer cleaning (wet bench) process
Photoresist solvent removal by heating
Deionized water heating for wafer washing
Air and nitrogen heating for wafer drying
Heating acid, IPA, Piranha, NMP, etc.
Use with one way or recirculation system
Features and advantages:
The flow path has no contact with the heating element
The medium is isolated in a PFA (Teflon) flow tube (high purity heating)
Allow safe heating of hazardous liquids and gases
Flow tube can be safely used for a variety of corrosive solvents
Flow tube can be replaced on site (no need to call service phone)
Compatible with standard control (PID, PLC, multi-loop, etc.)
The main body is coated with Teflon to achieve the greatest degree of cleanliness
Self-discharge flow tube and long life heating element
